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Safety Information

910716

Sigma-Aldrich

Poly(butyl methacrylate)

free flow beads, Mw 211,000

Synonym(s):

PBMA

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About This Item

Linear Formula:
(C8H14O2)n
CAS Number:
UNSPSC Code:
12162002
NACRES:
NA.23

description

Brookfield Viscosity in 40% toluene: 500-800 cPs
Glass transition temperature onset: 20 °C
Maximum % Moisture: 0.30%

form

solid (bead)

mol wt

Mw 211,000

refractive index

n/D 1.483

density

1.07 g/mL at 25 °C (lit.)

InChI

1S/C8H14O2/c1-4-5-6-10-8(9)7(2)3/h2,4-6H2,1,3H3

InChI key

SOGAXMICEFXMKE-UHFFFAOYSA-N

General description

Additional Benefit:

Conventional high molecular weight poly(butyl methacrylate) easily forms a fused block that require mechanical force (such as hammering) to break it down into small particles before usage. This product was developed with an anti-blocking technology and comes in an easy-to-use, free flowing, bead form.

Application

Poly(butyl methacrylate) finds applications in various areas.

It may be used to study the photoluminescence in EuTFC embedded in Poly(butyl methacrylate) (PBMA) polymer films.

It has also been used for coatings, surface modification, solid state battery, silk screen inks, adhesives for plastic and aluminum, plasticizer for hard butyl methacrylate resins, and for improving outdoor durability of vinyl chloride resins in pigmented lacquers.

Preparation Note

How to Prepare Solutions:

This polymer dissolves at room temperature but requires constant agitation to prevent solvent-swollen granules of polymer from forming agglomerates and sticking to the walls of the vessel.
Important: The polymer beads should be sifted directly into the vortex of the stirred solvent to speed wetting-out and dispersion. Continuous low-shear agitation for periods of 1-12 hours, depending on the grade and concentration of resin, is recommended.

After the solution appears clear in the tank, a sample should be spread out on a Leneta card or glass. After the solvent evaporates and a film forms on the card or glass, there should not be any resin seeds. If there are any seeds, the tank should be agitated further to fully dissolve the resin. Tank agitation should not be stopped (except for sampling) until the film test indicates there are no resin seeds. Any cloudiness or residue may indicate that some polymer remains undissolved. The presence of water in the system can also cause cloudiness.
Solution time can be reduced by heating; most common solvents can be heated to approximately 49°C (120°F) without the need for reflux equipment. High-shear agitation also cuts dissolving time, but requires care to avoid overheating and excessive solvent loss.

Pictograms

Exclamation mark

Signal Word

Warning

Hazard Statements

Hazard Classifications

Skin Sens. 1

Storage Class Code

11 - Combustible Solids

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable


Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

PRTR

Class II Designated Chemical Substances

ISHL Indicated Name

Substances Subject to be Indicated Names

ISHL Notified Names

Substances Subject to be Notified Names

JAN Code

910716-BULK:
910716-5G:
910716-250G:
910716-VAR:


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Kamil Awsiuk et al.
Biomacromolecules, 20(6), 2185-2197 (2019-04-25)
Poly( n-butyl methacrylate) (PBMA) or poly( n-butyl acrylate) (PBA)-grafted brush coatings attached to glass were successfully prepared using atom-transfer radical polymerization "from the surface". The thicknesses and composition of the PBMA and PBA coatings were examined using ellipsometry and time-of-flight
A polymeric coat for nanodroplets.
Anna Carlmark
Nature nanotechnology, 14(7), 640-641 (2019-05-22)
A poly(butyl methacrylate)/graphene oxide/TiO2 nanocomposite coating with superior corrosion protection for AZ31 alloy in chloride solution
Nazeer A A, et al.
Chemical Engineering Journal, 361, 485-498 (2019)
Micro and nanometer scale photopatterning of self-assembled monolayers
Leggett G J
Material Matters, 6(1), 22-29 (2011)

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