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Safety Information

496863

Sigma-Aldrich

Pentakis(dimethylamino)tantalum(V)

99.99%

Synonym(s):

PDMAT, TADMA, Ta(NMe2)5, Tantalum dimethylamide

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About This Item

Linear Formula:
Ta(N(CH3)2)5
CAS Number:
19824-59-0
Molecular Weight:
401.33
MDL number:
MFCD01631286
UNSPSC Code:
12352103
PubChem Substance ID:
24873088
NACRES:
NA.23

Quality Level

100

Assay

99.99%

form

solid

reaction suitability

core: tantalum
reagent type: catalyst

mp

100 °C (dec.) (lit.)

SMILES string

CN(C)[Ta](N(C)C)(N(C)C)(N(C)C)N(C)C

InChI

1S/5C2H6N.Ta/c5*1-3-2;/h5*1-2H3;/q5*-1;+5

InChI key

VSLPMIMVDUOYFW-UHFFFAOYSA-N

General description

Atomic number of base material: 73 Tantalum

Features and Benefits

Volatile solid CVD precursor to tantalum nitride (TaN) thin films. Also yields tantalum oxide (Ta2O5) thin films when O2, H2O, NO or H2O2 is present during the deposition process. Ta2O5 thins films show promise as gate dielectric materials in the manufacture of integrated circuits.

Pictograms

FlameCorrosion
GHS02,GHS05

Signal Word

Danger

Hazard Statements

H228,H260,H314

Hazard Classifications

Eye Dam. 1 - Flam. Sol. 1 - Skin Corr. 1B - Water-react 1

Storage Class Code

4.3 - Hazardous materials which set free flammable gases upon contact with water

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

JAN Code

496863-VAR:
496863-5G:
496863-BULK:

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Certificates of Analysis (COA)

Lot/Batch Number
SHBG7719V
SHBC8197V
SHBB0436V
29796BP
29796BPV

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James E Maslar et al.
Applied spectroscopy, 74(10), 1219-1229 (2019-10-17)
A nondispersive infrared gas analyzer was demonstrated for investigating metal alkylamide precursor delivery for microelectronics vapor deposition processes. The nondispersive infrared analyzer was designed to simultaneously measure the partial pressure of pentakis(dimethylamido) tantalum, a metal precursor employed in high volume

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