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394505

Sigma-Aldrich

Xenon difluoride

99.99% trace metals basis

Synonym(s):

Xenon Fluoride (XeF2)

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About This Item

Linear Formula:
XeF2
CAS Number:
13709-36-9
Molecular Weight:
169.29
EC Number:
237-251-2
MDL number:
MFCD00040538
UNSPSC Code:
12352300
PubChem Substance ID:
24864601
NACRES:
NA.23

vapor pressure

3.8 mmHg ( 25 °C)

Assay

99.99% trace metals basis

form

crystals

mp

129 °C (lit.)

density

4.32 g/mL at 25 °C (lit.)

SMILES string

F[Xe]F

InChI

1S/F2Xe/c1-3-2

InChI key

IGELFKKMDLGCJO-UHFFFAOYSA-N

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General description

Xenon fluoride may be obtained by interacting elemental xenon and fluorine in the temperature range of 473-523 oC and 5 absolute atmosphere. Xenon difluoride readily interacts with Lewis acid and forms complexes.

Application

Very useful fluorination agent. Xenon fluoride may be used as a fluorinating agent to analyze sulphur, selenium and tellurium by gas chromatography.

Packaging

Packaged in PFA/FEP bottles

Signal Word

Danger

Hazard Statements

H272,H301,H314,H330

Hazard Classifications

Acute Tox. 1 Inhalation - Acute Tox. 3 Oral - Eye Dam. 1 - Ox. Sol. 2 - Skin Corr. 1B

Storage Class Code

5.1B - Oxidizing hazardous materials

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

ISHL Indicated Name

Substances Subject to be Indicated Names

ISHL Notified Names

Substances Subject to be Notified Names

JAN Code

394505-1G:4548173939544
394505-BULK:
394505-5G:4548173939551
394505-VAR:

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Certificates of Analysis (COA)

Lot/Batch Number
MKCN7572
MKCJ4158
MKCD3827
MKCB9326
MKBX9556V

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Use of Xenon difluoride for the determination of sulfur, selenium and tellurium as the volatile fluorides by gas chromatography
Aleinikov NN, et al.
Russian Chemical Bulletin, 22(11), 2552-2554 (1973)
Infrared spectra of complex compounds of xenon difluoride with ruthenium pentafluoride
Prusakov VN, et al.
Journal of Applied Spectroscopy, 17(1), 920-922 (1972)
Fluorination with XeF(2).(1) 44. Effect of Geometry and Heteroatom on the Regioselectivity of Fluorine Introduction into an Aromatic Ring.
Marko Zupan et al.
The Journal of organic chemistry, 63(3), 878-880 (2001-10-24)
Tsung Yi Chiang et al.
Journal of synchrotron radiation, 17(1), 69-74 (2009-12-24)
The synchrotron radiation (SR) stimulated etching of silicon elastomer polydimethylsiloxane (PDMS) using XeF(2) as an etching gas has been demonstrated. An etching system with differential pumps and two parabolic focusing mirrors was constructed to perform the etching. The PDMS was
Minseob Kim et al.
Nature chemistry, 2(9), 784-788 (2010-08-24)
The application of pressure, internal or external, transforms molecular solids into extended solids with more itinerant electrons to soften repulsive interatomic interactions in a tight space. Examples include insulator-to-metal transitions in O(2), Xe and I(2), as well as molecular-to-non-molecular transitions
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