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Safety Information

175552

Sigma-Aldrich

Trichlorosilane

99%

Synonym(s):

Hydrotrichlorosilane, Silicochloroform, Silicon chloride hydride, Trichloromonosilane

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About This Item

Linear Formula:
SiHCl3
CAS Number:
10025-78-2
Molecular Weight:
135.45
EC Number:
233-042-5
MDL number:
MFCD00011518
UNSPSC Code:
12352101
PubChem Substance ID:
24850509
NACRES:
NA.22

vapor density

1 (vs air)

Quality Level

200

vapor pressure

9.75 psi ( 20 °C)

Assay

99%

form

liquid

expl. lim.

70 %

bp

32-34 °C (lit.)

density

1.342 g/mL at 25 °C (lit.)

storage temp.

2-8°C

SMILES string

Cl[SiH](Cl)Cl

InChI

1S/Cl3HSi/c1-4(2)3/h4H

InChI key

ZDHXKXAHOVTTAH-UHFFFAOYSA-N

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General description

Trichlorosilane is used as a reducing agent in certain chemical reactions or as a starting material for the synthesis of various organosilicon compounds. Trichlorosilane is generally used for the asymmetric hydrosilylation of olefins in the presence of palladium catalysts coordinated with chiral monodentate phosphorus ligands to generate chiral organosilanes.

Application

Trichlorosilane has been used to synthesize 11-dicyclohexylphosphino-12-phenyl-9,10-dihydro-9,10-ethenoanthracene (H-KITPHOS) via reduction of 11-dicyclohexylphosphinoyl-12-phenyl-9,10-dihydro-9,10-ethenoanthracene.
Other possible applications:
  • Asymmetric reduction of N-aryl ketimines in the presence of a novel

L-valine-derived catalyst to form secondary amines.
  • Hydrosilylation of imidazolinones to form chiral imidazolidinones in the presence of a 2,2′-bispyrrolidine based Lewis base organocatalyst.
  • Trichlorosilane activated with chiral N-formylproline

derivatives is an effective reagent for the reduction of imines to form
enantiomerically enriched amines.
  • Trichlorosilane reacts with dimethylformamide to form hypervalent hydridosilicates, which can reduce aldehydes to alcohols, imines to amines, and also for the reductive amination of aldehydes.

Signal Word

Danger

Hazard Statements

H224,H260,H302,H314,H331

Hazard Classifications

Acute Tox. 3 Inhalation - Acute Tox. 4 Oral - Eye Dam. 1 - Flam. Liq. 1 - Skin Corr. 1A - Water-react 1

Supplementary Hazards

EUH014,EUH029,EUH071

Storage Class Code

4.3 - Hazardous materials which set free flammable gases upon contact with water

WGK

WGK 1

Flash Point(F)

<-2.2 °F - Equilibrium method

Flash Point(C)

< -19 °C - Equilibrium method

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

PDSCL

Deleterious substance

FSL

Group 3: Spontaneously combustible substances and water- reactive materials
Chlorinated silicon compounds
Hazardous rank I
1st spontaneously combustible materials and water reactive materials

ISHL Indicated Name

Substances Subject to be Indicated Names

ISHL Notified Names

Substances Subject to be Notified Names

JAN Code

175552-100G:4548173109220
175552-250G:
175552-VAR:
175552-PZ:
175552-10KG:
175552-500G:4548173109237
175552-5G:4548173109244
175552-BULK:

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Certificates of Analysis (COA)

Lot/Batch Number
SHBN8807
STBK4375
STBK3561
SHBN4255
STBK2725

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First chemo-and stereoselective reduction of imines using trichlorosilane activated with N-formylpyrrolidine derivatives
Iwasaki F
Tetrahedron Letters, 42(13), 2525-2527 (2001)
Trinh Lam et al.
Scientific reports, 7(1), 1188-1188 (2017-04-28)
A chemically patterned microfluidic paper-based analytical device (C-µPAD) is developed to create fluidic networks by forming hydrophobic barriers using chemical vapor deposition (CVD) of trichlorosilane (TCS) on a chromatography paper. By controlling temperature, pattern size, and CVD duration, optimal conditions
Naama Peor et al.
Journal of the American Chemical Society, 130(12), 4158-4165 (2008-03-05)
Electronic structures at the Si/SiO2/molecule interfaces were studied by Kelvin probe techniques (contact potential difference) and compared to theoretical values derived by the Helmholtz equation. Two parameters influencing the electronic properties of n-type <100> Si/SiO2 substrates were systematically tuned: the
Hyundong Yoo et al.
Scientific reports, 8(1), 6904-6904 (2018-05-04)
Silicon (Si) based materials are highly desirable to replace currently used graphite anode for lithium ion batteries. Nevertheless, its usage is still a big challenge due to poor battery performance and scale-up issue. In addition, two-dimensional (2D) architectures, which remain
S J Yuan et al.
ACS applied materials & interfaces, 1(3), 640-652 (2010-04-02)
To improve the biocorrosion resistance of stainless steel (SS) and to confer the bactericidal function on its surface for inhibiting bacterial adhesion and biofilm formation, well-defined inorganic-organic hybrid coatings, consisting of the inner compact titanium oxide multilayers and outer dense
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