NIST2134
Arsenic implant in silicon depth profile standard
NIST SRM 2134
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About This Item
grade
certified reference material
Quality Level
packaging
pkg of each
manufacturer/tradename
NIST®
application(s)
semiconductor
format
matrix material
General description
Each unit of SRM 2134 contains a single crystal silicon substrate, measuring 1 cm by 1 cm, which is ion-implanted with the isotope 75 As at an approximate energy of 100 keV.
SRM 2134_cert
SRM 2134_SDS
SRM 2134_cert
SRM 2134_SDS
Application
The SRM is used to calibrate the secondary ion response to detect the minor and trace levels of arsenic within a silicon matrix using the analytical technique of secondary ion mass spectrometry (SIMS).
Features and Benefits
- Available with a certificate documenting NIST-certified value for retained dose of 75As atoms and the dose is expressed in units of arsenic mass per unit area.
- The reference and information values of elements are reported as mass fraction.
- Certified values are retained dose of 75As atoms, and the dose is expressed in units of arsenic mass per unit area.
- The NIST certificate is provided with expiration certificate, use, storage, handling, and maintenance instructions.
Other Notes
Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values.
Arsenic (75As)
See certificate for values and more details at nist.gov/SRM.
Arsenic (75As)
See certificate for values and more details at nist.gov/SRM.
Legal Information
NIST is a registered trademark of National Institute of Standards and Technology
Storage Class Code
13 - Non Combustible Solids
WGK
nwg
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
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