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vapor density
>1 (vs air)
Assay
≥98%
form
liquid
refractive index
n20/D 1.377 (lit.)
bp
101 °C (lit.)
101 °C
mp
−59 °C (lit.)
density
0.764 g/mL at 20 °C (lit.)
SMILES string
C[Si](C)(C)O[Si](C)(C)C
InChI
1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3
InChI key
UQEAIHBTYFGYIE-UHFFFAOYSA-N
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General description
Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane in silicon integrated circuit technology. Its dissociative ionization by electron impact has been studied by Fourier transform mass spectrometry. Synthesis of plasma-polymerized HMDSO thin films by atmospheric pressure glow (APG) discharge has been reported. Crystals of HMDSO at 148K are monoclinic. Addition of HMDSO to P4S10, improves its efficiency as thionating agent.
Application
Hexamethyldisiloxane can be used:
- To fabricate a gas diffusion layer (GDL) with controlled hydrophobic silicone nano-layer by the dry deposition process.
- To prepare silver nanoparticles coated with silica using arginine and glucose as the catalyst and the reducing agent, respectively.
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 2
Storage Class Code
3 - Flammable liquids
WGK
WGK 2
Flash Point(F)
21.2 °F - closed cup
Flash Point(C)
-6 °C - closed cup
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves
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