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651761

Sigma-Aldrich

Negative resist remover I

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About This Item

UNSPSC Code:
12352300

shelf life

1 yr (cool area away from direct sunlight)

Quality Level

100

pH

<2 (20 °C)

bp

204-304 °C (lit.)

density

1.00 g/mL at 25 °C (lit.)

storage temp.

2-8°C

Related Categories

General description

Available as part of Negative Photoresist kit 654892
Low pH formulation for removal of photoresist cured onto various substrates. Non-corrosive to metals and oxides. Does not contain chlorinated hydrocarbons, chromates, phenol, or phosphates. Performs well at room and elevated temperatures.

Signal Word

Danger

Hazard Classifications

Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Skin Corr. 1

Storage Class Code

8A - Combustible, corrosive hazardous materials

WGK

WGK 3

Flash Point(F)

204.8 °F

Flash Point(C)

96 °C

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Protocols

Negative Photoresist Procedure

Our photoresist kit was designed to have the necessary chemical components for each step in the lithographic process. The component materials are provided in pre-weighed quantities for your convenience. Etchants are available separately so that the proper etchant can be chosen for a variety of substrate choices.

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

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