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767514

Sigma-Aldrich

Tantal

sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis

Synonym(e):

Ta

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About This Item

Empirische Formel (Hill-System):
Ta
CAS-Nummer:
7440-25-7
Molekulargewicht:
180.95
EG-Nummer:
231-135-5
MDL-Nummer:
MFCD00011252
UNSPSC-Code:
12352103
PubChem Substanz-ID:
329767321
NACRES:
NA.23

Dampfdruck

<0.01 mmHg ( 537.2 °C)

Assay

99.95% trace metals basis

Form

foil

Selbstzündungstemp.

572 °F

Eignung der Reaktion

core: tantalum

Widerstandsfähigkeit

13.5 μΩ-cm, 20°C

Durchm. × Dicke

2.00 in. × 0.25 in.

bp

5425 °C (lit.)

mp (Schmelzpunkt)

2996 °C (lit.)

Dichte

16.69 g/cm3 (lit.)

SMILES String

[Ta]

InChI

1S/Ta

InChIKey

GUVRBAGPIYLISA-UHFFFAOYSA-N

Anwendung

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

Lagerklassenschlüssel

11 - Combustible Solids

WGK

nwg

Flammpunkt (°F)

Not applicable

Flammpunkt (°C)

Not applicable

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Kostantinidis; S.;
The European Physical Journal - Applied Physics, 56(2), 24002/1-24002/1 (2011)
Helmersson; U.;
Thin Solid Films, 513(1-2), 1-1 (2006)
Robert Cohen
American journal of orthopedics (Belle Mead, N.J.), 31(4), 216-217 (2002-05-15)
Conventional materials used for orthopedic reconstruction implants limit the design of new and improved implants. Solid metal is rigid. Porous fixation surfaces have low volumetric porosity available for biologic ingrowth and low frictional characteristics for initial implant stability and have
J Black
Clinical materials, 16(3), 167-173 (1993-12-09)
A detailed literature search was carried out to define the current knowledge about the biological performance of tantalum. The pure metal appears, to a great degree, to be inert both in vivo and in vitro. Both the pure metal and
Jian Lu et al.
Zhongguo xiu fu chong jian wai ke za zhi = Zhongguo xiufu chongjian waike zazhi = Chinese journal of reparative and reconstructive surgery, 26(2), 244-247 (2012-03-13)
To review the progress in the treatment of bone defect by porous tantalum implant. Recent literature was extensively reviewed and summarized, concerning the treatment method of bone defect by porous tantalum implant. By right of their unique properties, porous tantalum
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