Skip to Content
Merck
All Photos(1)

Documents

205184

Sigma-Aldrich

Hexachlorodisilane

96%

Synonym(s):

1,1,1,2,2,2-Hexachlorodisilane, Disilicon hexachloride, HCDS

Sign Into View Organizational & Contract Pricing
All Photos(1)

About This Item

Linear Formula:
(SiCl3)2
CAS Number:
13465-77-5
Molecular Weight:
268.89
EC Number:
236-704-1
MDL number:
MFCD00011599
UNSPSC Code:
12352103
PubChem Substance ID:
24852311
NACRES:
NA.23

Assay

96%

form

liquid

refractive index

n20/D 1.475 (lit.)

bp

144-145.5 °C (lit.)

density

1.562 g/mL at 25 °C (lit.)

SMILES string

Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl

InChI

1S/Cl6Si2/c1-7(2,3)8(4,5)6

InChI key

LXEXBJXDGVGRAR-UHFFFAOYSA-N

Looking for similar products? Visit Product Comparison Guide

General description

Hexachlorodisilane (HCDS) is a chlorosilane used as a precursor for producing disilanes. It is a dioxidizer that is used in the production of silicon films and silicon nitride based films.

Application

HCDS can be used in the fabrication of silica aerogels by chemical vapor deposition (CVD), which can be potentially used as encapsulating agents and thermal insulators. It can also be used to synthesize 1,1,1,2,2,2-hexaamino-disilanes using CVD, which forms silicon-based films for microelectronic-based applications.
HCDS may be used as a reducing agent. It may be combined with ammonia to form silicon nitride by chemical vapor deposition(CVD) technique.

Pictograms

Corrosion
GHS05

Signal Word

Danger

Hazard Statements

H314

Hazard Classifications

Skin Corr. 1B

Supplementary Hazards

EUH014

Storage Class Code

8A - Combustible, corrosive hazardous materials

WGK

WGK 3

Flash Point(F)

Not applicable

Flash Point(C)

Not applicable

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

Already Own This Product?

Find documentation for the products that you have recently purchased in the Document Library.

Visit the Document Library

Film Properties of Low?k Silicon Nitride Films Formed by Hexachlorodisilane and Ammonia.
Tanaka M , et al.
Journal of the Electrochemical Society, 147(6), 2284-2289 (2000)
Enhancing mechanical properties of silica aerogels
Obrey, K. A., Wilson, K. V., & Loy, D. A.
Journal of Non-Crystalline Solids, 375(19), 3435-3441 (2011)
Z Yu et al.
Journal of chromatography. A, 903(1-2), 183-191 (2001-01-12)
Carbon isotopic compositions of aetio I occurring in the form of free-base, nickel, demetallation, dihydroxysilicon(IV) and bis(tert.-butyldimethylsiloxy)silicon(IV) [(tBDMSO)2Si(IV)] have shown that it has experienced no obvious isotope fractionation during the synthesis of [(tBDMSO)2Si(IV)] porphyrin from aetio I. Here, aetio I
The Raman Spectrum of Hexachlorodisilane
Katayama M, et al.
J. Chem. Phys., 18(4), 506-509 (1950)
Chemical vapor deposition of silicon films using hexachlorodisilane
Taylor, R. C., Scott, B. A., Lin, S. T., LeGoues, F., & Tsang, J. C.
MRS Proceedings, 77, 709-709 (1986)
View All Related Papers

Our team of scientists has experience in all areas of research including Life Science, Material Science, Chemical Synthesis, Chromatography, Analytical and many others.

Contact Technical Service