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Sigma-Aldrich

Octadecylphosphonsäure

97%

Synonym(e):

n-Octadecylphosphonsäure, ODPA

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About This Item

Empirische Formel (Hill-System):
C18H39O3P
CAS-Nummer:
4724-47-4
Molekulargewicht:
334.47
MDL-Nummer:
MFCD00015838
UNSPSC-Code:
12352300
PubChem Substanz-ID:
329762947
NACRES:
NA.23

Assay

97%

Form

crystals

mp (Schmelzpunkt)

95-100 °C

SMILES String

CCCCCCCCCCCCCCCCCCP(O)(O)=O

InChI

1S/C18H39O3P/c1-2-3-4-5-6-7-8-9-10-11-12-13-14-15-16-17-18-22(19,20)21/h2-18H2,1H3,(H2,19,20,21)

InChIKey

FTMKAMVLFVRZQX-UHFFFAOYSA-N

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Allgemeine Beschreibung

Octadecylphosphonic acid (OPA) is used as a self-assembled monolayer that forms a surfactant which strongly bonds with the surface atoms of different metal oxides. It provides hydrophobic properties and covers a higher surface area than the predominantly used silanes.

Anwendung

Anti-corrosive coatings on cupronickel (CuNi) can be formed by fabricating a protective film of OPA by dip coating method. OPA may be used in the preparation of indium oxide(In2O3) nanowire transistor than can find potential application in the growth of fast switching and low noise nano-electronic devices. It may be used for self-cleaning and oil/water separation based applications as it forms a superhydrophobic layer on the copper mesh.

Piktogramme

Exclamation mark
GHS07

Signalwort

Warning

H-Sätze

H315,H319

Gefahreneinstufungen

Eye Irrit. 2 - Skin Irrit. 2

Lagerklassenschlüssel

11 - Combustible Solids

WGK

WGK 3

Analysenzertifikate (COA)

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Fabrication of controllable and stable In2O3 nanowire transistors using an octadecylphosphonic acid self-assembled monolayer.
Lim T, et al.
Nanotechnology, 26(14), 145203-145203 (2015)
Modification of cupronickel alloy surface with octadecylphosphonic acid self-assembled films for improved corrosion resistance.
Mioc K, et al.
Corrosion Science, 134(10), 189-198 (2018)
Getachew Tizazu et al.
Langmuir : the ACS journal of surfaces and colloids, 25(18), 10746-10753 (2009-07-18)
Electron-hole pair formation at titania surfaces leads to the formation of reactive species that degrade organic materials. Here, we describe the degradation of self-assembled monolayers of alkylphosphonic acids on the native oxide of titanium following exposure to UV light. The
n-Octadecylphosphonic acid grafted mesoporous magnetic nanoparticle: Preparation, characterization, and application in magnetic solid-phase extraction.
Ding J, et al.
Journal of Chromatography A, 1217(47), 7351-7358 (2010)
Fast formation of superhydrophobic octadecylphosphonic acid (ODPA) coating for self-cleaning and oil/water separation.
Dai C, et al.
Soft Matter, 10(40), 8116-8121 (2014)
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Micro and Nanometer Scale Photopatterning of Self-Assembled Monolayers

Self-assembled monolayers (SAMs) have attracted enormous interest for a wide variety of applications in micro- and nano-technology. In this article, we compare the benefits of three different classes of SAM systems (alkylthiolates on gold.

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