T33200
Thiosalicylic acid
97%
Sinónimos:
2-Sulfanylbenzoic acid, 2-Mercaptobenzoic acid
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About This Item
Productos recomendados
Quality Level
assay
97%
mp
162-165 °C (lit.)
SMILES string
OC(=O)c1ccccc1S
InChI
1S/C7H6O2S/c8-7(9)5-3-1-2-4-6(5)10/h1-4,10H,(H,8,9)
InChI key
NBOMNTLFRHMDEZ-UHFFFAOYSA-N
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Application
Thiosalicylic acid can be used as:
It can also be used to prepare 2-thioxanthone-thioacetic acid bimolecular system, which is used as a photoinitiator for free radical polymerization.
- A nucleophilic trapping agent for the desulfenylation of 3-indolyl sulfides to obtain 3-unsubstituted indoles.
- A starting material to prepare 2′-mercaptoacetophenone, which is used in the synthesis of thioflavanone by reacting with lithium diisopropylamide and benzaldehyde.
- A stabilizing agent in the synthesis of metal nanoparticles.
It can also be used to prepare 2-thioxanthone-thioacetic acid bimolecular system, which is used as a photoinitiator for free radical polymerization.
signalword
Warning
hcodes
Hazard Classifications
Eye Irrit. 2 - Skin Irrit. 2 - STOT SE 3
target_organs
Respiratory system
Storage Class
11 - Combustible Solids
wgk_germany
WGK 3
ppe
dust mask type N95 (US), Eyeshields, Gloves
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The Journal of Organic Chemistry, 59, 6372-6372 (1994)
Synthesis and characterization of thiosalicylic acid stabilized gold nanoparticles
Spectrochimica Acta. Part A, Molecular and Biomolecular Spectroscopy, 74(1), 195-199 (2009)
A new chemical method to desulfenylate indol-3-yl sulfides
Phosphorus, Sulfur, and Silicon and the Related Elements, 74(1-4), 391-391 (1993)
Journal of the American Academy of Dermatology, 23(3 Pt 1), 479-483 (1990-09-01)
A photocontact dermatitis developed in three patients after the application of gel containing 0.5% piroxicam. Patch tests were positive to thiomersal and thiosalicylic acid. Photopatch tests with piroxicam at several concentrations were positive in the three patients but negative in
One-Component Bimolecular Photoinitiating Systems, 2
Macromolecular Rapid Communications, 24(12), 718-723 (2003)
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