Simple method of specimen preparation for scanning electron microscopy.

Bulletin of experimental biology and medicine (2012-03-28)
S V Buravkov, V P Chernikov, L B Buravkova
ABSTRACT

We compared conventional method for specimen (cell cultures, tissue specimens) preparation for scanning electron microscopy and a method without sputtering and critical-point drying. OTO-method (osmium-thiocarbohydrazide-osmium) with sample impregnation with hexamethyldisilazane followed by air drying was used as an alternative method. Excellent preservation of surface ultrastructures and electrical conductivity was proved. The method is easy to use and does not require additional costs for equipment.

MATERIALS
Product Number
Brand
Product Description

Sigma-Aldrich
Hexamethyldisilazane, reagent grade, ≥99%
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 1.0 M in THF
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide solution, 1.0 M in THF
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide solution, 1 M in THF
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide, 97%
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide, 95%
Sigma-Aldrich
Hexamethyldisilazane, ReagentPlus®, 99.9%
Supelco
Hexamethyldisilazane, for GC derivatization, LiChropur, ≥99.0% (GC)
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide solution, 0.5 M in toluene
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 1 M in toluene
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide, 95%
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 1.5 M in THF
Sigma-Aldrich
Hexamethyldisilazane, produced by Wacker Chemie AG, Burghausen, Germany, ≥97.0% (GC)
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 1.0 M in hexanes
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide solution, produced by Wacker Chemie AG, Burghausen, Germany, 40% in THF
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide solution, 0.6 M in toluene
Sigma-Aldrich
Tris[N,N-bis(trimethylsilyl)amide]yttrium
Sigma-Aldrich
Tris[N,N-Bis(trimethylsilyl)amide]gadolinium(III), 98%
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 1 M in tert-butyl methyl ether
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide solution, 1.0 M in methyl tert-butyl ether
Sigma-Aldrich
Tris[N,N-bis(trimethylsilyl)amide]samarium(III), 98%
Sigma-Aldrich
Tris[N,N-bis(trimethylsilyl)amide]europium(III), 98%
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 0.5 M in 2-methyltetrahydrofuran
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide solution, 1.0 M in 2-methyltetrahydrofuran
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide solution, 0.5 M in methyl tert-butyl ether
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 0.5 M in toluene
Sigma-Aldrich
Tris[N,N-bis(trimethylsilyl)amide]yttrium, packaged for use in deposition systems