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Novel Inks for Direct-Write Assembly of 3-D Periodic Structures
New methods for materials fabrication at the micro- and nanoscale will drive scientific and technological advances in areas of materials science, chemistry, physics, and biology. The broad diversity of potentially relevant materials, length scales, and architectures underscores the need for
Few Monolayer Atomic Layer Deposition (ALD) on Surfaces and Interfaces for Energy Applications
Few Monolayer Atomic Layer Deposition (ALD) on Surfaces and Interfaces for Energy Applications
A Review of Mesoporous TiO2 Thin Films
Titanium dioxide (TiO2) is an important n-type semiconducting material that shows interesting characteristics such as photoswitchable surface wettability, high photocatalytic activity, bistable electrical resistance states and high electron drift mobility.
A Review of Mesoporous TiO2 Thin Films
In this paper, we discuss recent advances in the preparation of various TiO2 porous structures via hard and soft-templating routes. Specifically, we focus on recent developments in TiO2 mesoporous thin films in a combined sol-gel and evaporation-induced self-assembly (EISA) process.
Nanowire Synthesis: From Top-Down to Bottom-Up
The properties of many devices are limited by the intrinsic properties of the materials that compose them.