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  • Covalent and stable CuAAC modification of silicon surfaces for control of cell adhesion.

Covalent and stable CuAAC modification of silicon surfaces for control of cell adhesion.

Chembiochem : a European journal of chemical biology (2015-03-05)
Surendra Vutti, Nina Buch-Månson, Sanne Schoffelen, Nicolas Bovet, Karen L Martinez, Morten Meldal
ABSTRACT

Stable primary functionalization of metal surfaces plays a significant role in reliable secondary attachment of complex functional molecules used for the interfacing of metal objects and nanomaterials with biological systems. In principle, this can be achieved through chemical reactions either in the vapor or liquid phase. In this work, we compared these two methods for oxidized silicon surfaces and thoroughly characterized the functionalization steps by tagging and fluorescence imaging. We demonstrate that the vapor-phase functionalization only provided transient surface modification that was lost on extensive washing. For stable surface modification, a liquid-phase method was developed. In this method, silicon wafers were decorated with azides, either by silanization with (3-azidopropyl)triethoxysilane or by conversion of the amine groups of an aminopropylated surface by means of the azido-transfer reaction. Subsequently, D-amino acid adhesion peptides could be immobilized on the surface by use of Cu(I)-catalyzed click chemistry. This enabled the study of cell adhesion to the metal surface. In contrast to unmodified surfaces, the peptide-modified surfaces were able to maintain cell adhesion during significant flow velocities in a microflow reactor.

MATERIALS
Product Number
Brand
Product Description

Supelco
Sulfuric acid, for the determination of nitrogen, ≥97.0%
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N-Ethyldiisopropylamine, BASF quality, ≥98.0%
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N,N-Dimethylformamide, analytical standard
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Methanol, analytical standard
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N-Ethyldiisopropylamine solution, suitable for peptide synthesis, ~2 M in 1-methyl-2-pyrrolidinone
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Copper(II) sulfate pentahydrate, purum p.a., crystallized, ≥99.0% (RT)
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Copper(II) sulfate pentahydrate, 99.995% trace metals basis
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Trifluoromethanesulfonic anhydride, 99%
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Copper(II) sulfate pentahydrate, 99.999% trace metals basis
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Acetone, ≥99%, meets FCC analytical specifications
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Acetone, natural, ≥97%
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(3-Aminopropyl)triethoxysilane, 99%
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Hydrogen peroxide solution, tested according to Ph. Eur.
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(3-Aminopropyl)triethoxysilane, ≥98%
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Hydrogen peroxide solution, 30 % (w/w) in H2O, contains stabilizer
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(3-Aminopropyl)triethoxysilane, packaged for use in deposition systems, ≥98%
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Methanol solution, NMR reference standard, 4% in methanol-d4 (99.8 atom % D), NMR tube size 3 mm × 8 in.
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Hydrogen peroxide solution, 30 % (w/w), for ultratrace analysis