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  • SEM sample preparation for cells on 3D scaffolds by freeze-drying and HMDS.

SEM sample preparation for cells on 3D scaffolds by freeze-drying and HMDS.

Scanning (2012-04-26)
Juliana Tsz Yan Lee, King Lau Chow
ABSTRACT

Common dehydration methods of cells on biomaterials for scanning electron microscopy (SEM) include air drying, hexamethyldisilazane (HMDS) or tetramethysilane (TMS) treatment and critical point drying (CPD). On the other side, freeze-drying has been widely employed in dehydrating biological samples and also in preparing porous biomaterial scaffolds but not in preparing cells on three-dimensional (3D) biomaterials for SEM examination. In this study, we compare cells on porous hydroxyapatite (HA) prepared by air drying, HMDS and freeze-drying. The effects of fixation and using phosphate buffered saline (PBS) in the fixation were also assessed on three porous calcium phosphate (CaP) materials, namely, HA, α-tricalcium phosphate (α-TCP) and β-tricalcium phosphate (β-TCP) samples. There is no significant difference in samples prepared by HMDS treatment and freeze-drying viewed at low magnification. Besides, it is better not to use phosphate buffer in the fixation step for CaP materials to avoid undesirable spontaneous precipitation of CaPs. On the other hand, fewer exchanges of liquids are required for freeze-drying and hence chemical fixation may not be absolutely required for samples prepared by freeze-drying. Other technical details of the preparation were also investigated and discussed. This study suggests both HMDS and freeze-drying can be employed to dehydrate cells on 3D scaffolds for SEM examination.

MATERIALS
Product Number
Brand
Product Description

Sigma-Aldrich
Hexamethyldisilazane, produced by Wacker Chemie AG, Burghausen, Germany, ≥97.0% (GC)
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide solution, 40% in THF
Supelco
Hexamethyldisilazane, for GC derivatization, LiChropur, ≥99.0% (GC)
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide, 95%
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide solution, 0.5 M in toluene
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide solution, 0.6 M in toluene
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 1.0 M in hexanes
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide solution, 1.0 M in THF
Sigma-Aldrich
Sodium bis(trimethylsilyl)amide, 95%
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 1 M in tert-butyl methyl ether
Sigma-Aldrich
Hexamethyldisilazane, reagent grade, ≥99%
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 1.5 M in THF
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide solution, 1.0 M in 2-methyltetrahydrofuran
Sigma-Aldrich
Potassium bis(trimethylsilyl)amide solution, 1 M in THF
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 0.5 M in 2-methyltetrahydrofuran
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 1.0 M in THF
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide solution, 1 M in toluene
Sigma-Aldrich
Hexamethyldisilazane, ReagentPlus®, 99.9%
Sigma-Aldrich
Lithium bis(trimethylsilyl)amide, 97%
Sigma-Aldrich
Tris[N,N-bis(trimethylsilyl)amide]yttrium
Sigma-Aldrich
Tris[N,N-bis(trimethylsilyl)amide]samarium(III), 98%