What Does it Cover?
In the last decade the trend for hyphenating different analytical techniques became an more and more important role in analytical labs. Combinations like LC-LC-MS or LC-MS-MS help to solve the analysis of complex samples in a proper way. The Analytical data which could be received are more sensitive focused on special analytes or give a better overview of the whole sample composition.
This webinar should give the attendances an overview of the advantage and strength of (HP)TLC- MS coupling technique along various Applications from different analytical fields using different MS techniques. Tips and tricks for the right handling are be presented, to avoid main basic defaults.
What Will You Learn?
- Basics about TLC-MS coupling techniques and other hyphenation techniques
- Overview of different TLC-MS coupling techniques
- Examples to solve specific analytical challenges in an easy way
- Tips and tricks to avoid defaults in TLC-MS measurements
Who Should Watch?
- TLC/HPTLC/HPLC/MS customers from R&D, QC, Organic synthesis, Analytical labs
Speakers
Michaela Oberle
Merck
Senior Project Manager, R&D Technical & Innovation
Michaela Oberle started her career at Merck as a lab technician apprentice in 1992. She took over responsibilities in various departments and became specialist for analytical, preparative and flash chromatography. In 2000 she joined the Pigments and Cosmetics Research team in Darmstadt, Germany and held an R&D specialist position, where she was responsible for the extraction and analysis of natural compounds as well as for cosmetic efficacy screenings including skin and hair applications. Since 2012 Michaela Oberle acts as a R&D specialist in the Advanced analytics “Thin layer chromatography” department and took over responsibility for product development, customer requests, TLC applications and international trainings for TLC issues. She holds a degree of Bachelor of science in Business Chemistry.
Analytical chemistry
- Thin layer chromatography
Durée:1h 6min
Langue:English
Session 1:présenté(e) October 23, 2018
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