Reactive oxygen species and nitric oxide induce senescence of rudimentary leaves and the expression profiles of the related genes in Litchi chinensis.

Litchi is one of the most important subtropical evergreen fruit trees in southern Asia. Previous studies indicated that high-temperature conditions encourage growth of rudimentary leaves in panicles and suppress flowering. We have demonstrated that methyl viologen dichloride hydrate (MV) and sodium nitroprusside (SNP) promoted flowering in litchi partially by inhibiting the growth of rudimentary leaves via reactive oxygen species (ROS) and nitric oxide (NO). In the present study, we examined the microstructure and ultrastructure, programmed cell death (PCD) ratio, nuclei morphology of the rudimentary leaves, and the expression of senescence-related genes after the treatment with ROS or NO. The results showed that chromatins of the ROS- or NO-treated cells in the rudimentary leaves were condensed. Fusion of the cytoplasm-digesting vesicles with the vacuole and degradation of cytoplasm forming scattered debris were found in those of the treated cells. Treatment with ROS or NO increased the cell PCD ratio. Morphology of the nuclei stained by propidium iodide (PI) showed that nuclei shape became irregular after the ROS or NO treatment. Further, the expression levels of LcRboh, LcMC-1-like, and LcPirin were higher in the ROS- and NO-treated rudimentary leaves than those in the control ones, suggesting that these genes may be involved in the ROS and NO-induced senescence and abscission of the rudimentary leaves in litchi. Our results suggested that ROS and NO play an important role in inducing the senescence of the rudimentary leaves, and ROS- and NO-induced PCD may be involved in the regulation of the rudimentary leaf growth in litchi.