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  • Periodic nanotemplating by selective deposition of electroless gold island films on particle-lithographed dimethyldichlorosilane layers.

Periodic nanotemplating by selective deposition of electroless gold island films on particle-lithographed dimethyldichlorosilane layers.

ACS nano (2010-06-23)
Wonmi Ahn, D Keith Roper
ABSTRACT

Uniform hexagonal arrays of diverse nanotemplated metal structures were formed via selective electroless gold plating on particle-lithographed dimethyldichlorosilane layers. Surface-associated water at silica bead interstices was shown to correlate with the formation of silane rings with outer ring diameters ranging from 522.5+/-29.7 to 1116.9+/-52.6 nm and/or spherical gold nanoparticles with diameters from 145.5+/-20.2 to 389.1+/-51.1 nm in the array. Reproducibility and millimeter-size scalability of the array were achieved without the need for expensive and sophisticated lithography or metal deposition equipment. The formation of each structure was explained on the basis of the silanization mechanism and microscopic characterization, as well as dimensional analysis of the nanostructures. This new, facile, and versatile method enables fine fabrication of regular metal nanoparticle array platforms to improve optical and plasmonic features in nanoelectronics and nanophotonic devices.

MATERIALS
Product Number
Brand
Product Description

Sigma-Aldrich
Dichlorodimethylsilane, ≥99.5%
Sigma-Aldrich
Dichlorodimethylsilane, ≥98.5% (GC)
Sigma-Aldrich
Dichlorodimethylsilane, produced by Wacker Chemie AG, Burghausen, Germany, ≥99.0% (GC)
Supelco
Silanization solution I, ~5% (dimethyldichlorosilane in heptane), Selectophore