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Merck

407216

Sigma-Aldrich

Triarylsulfonium hexafluorophosphate salts, mixed

50% in propylene carbonate

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About This Item

Número de CAS:
MDL number:
UNSPSC Code:
12352300
PubChem Substance ID:
NACRES:
NA.23

form

liquid

concentration

50% in propylene carbonate

refractive index

n20/D 1.5 (lit.)

density

1.32 g/mL at 25 °C (lit.)

SMILES string

F[P-](F)(F)(F)(F)F.F[P-](F)(F)(F)(F)F.F[P-](F)(F)(F)(F)F.S(c1ccccc1)c2ccc(cc2)[S+](c3ccccc3)c4ccccc4.S(c5ccc(cc5)[S+](c6ccccc6)c7ccccc7)c8ccc(cc8)[S+](c9ccccc9)c%10ccccc%10

InChI

1S/C36H28S3.C24H19S2.3F6P/c1-5-13-31(14-6-1)38(32-15-7-2-8-16-32)35-25-21-29(22-26-35)37-30-23-27-36(28-24-30)39(33-17-9-3-10-18-33)34-19-11-4-12-20-34;1-4-10-20(11-5-1)25-21-16-18-24(19-17-21)26(22-12-6-2-7-13-22)23-14-8-3-9-15-23;3*1-7(2,3,4,5)6/h1-28H;1-19H;;;/q+2;+1;3*-1

InChI key

BXEZIWXFNSCYKD-UHFFFAOYSA-N

General description

Mixed triarylsulfonium hexafluorophosphate salts are cationic photoinitiators which are used as ultraviolet curing agents that have bifunctional cross-linking monomers.

Application

It can be mixed with propylene glycol monomethyl ether acetate (PGMA) that may be blended with bisphenol F resin which can be used in the fabrication of UV curable nano-imprinted epoxy resist. It can also be used as a photo-initiator for photo-polymerization of epoxy/acrylate composites which find applications in UV protective coating on electronic devices.

pictograms

Exclamation mark

signalword

Warning

hcodes

Hazard Classifications

Eye Irrit. 2

Storage Class

10 - Combustible liquids

wgk_germany

WGK 3

flash_point_f

235.4 °F - closed cup

flash_point_c

113 °C - closed cup

ppe

Eyeshields, Gloves, type ABEK (EN14387) respirator filter


Certificados de análisis (COA)

Busque Certificados de análisis (COA) introduciendo el número de lote del producto. Los números de lote se encuentran en la etiqueta del producto después de las palabras «Lot» o «Batch»

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Novel visible photoinitiators systems for free-radical/cationic hybrid photopolymerization.
Podsiadly R.
Dyes and Pigments, 91(3), 422-426 (2011)
Nanoimprinting ultrasmall and high-aspect-ratio structures by using rubber-toughened UV cured epoxy resist.
Shin YJ, et al.
Nanotechnology, 24(25), 255302-255302 (2013)
Kinetics study of the UV-initiated cationic polymerization of cycloaliphatic diepoxide resins.
Voytekunas VY, et al.
European Polymer Journal, 44(11), 3640-3649 (2008)

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